Used CANON / ANELVA ILC 1051 #9134662 for sale

CANON / ANELVA ILC 1051 is a physical vapor deposition (PVD) sputtering equipment designed to deposit high-quality thin films with precise control. The system is equipped with two cathodes that can be set up in any of the four supported configurations: DC, AC, RF, and DCMS. This allows for flexible operation, allowing for fast material cycling and higher process rates. The unit can be operated either in automated mode using its advanced operating machine, or within a controlled feed-back loop with a wide range of user-defined parameters. The gas-phase vacuum environment of the tool provides the most efficient and repeatable sputter deposition. The asset is powered by a 10 kW magnetron-type sputtering source with a shielded magnet and controlled field-division. The power supply is equipped with a pulse voltage up to a maximum of 3 kV, ensuring precise and highly effective processing. The model's modular design with separate chambers for each process helps provide maximum process flexibility. The high-precision and adjustable gas distributor helps ensure uniform distribution of gases over the wafer, and the high-precision substrate holder helps optimize plasma stability. The equipment is also equipped with an advanced in situ diagnostics system, which provides immediate feedback and assists in optimizing process control. The process sensors within the unit allow for quick and accurate adjustment of the gas pressure, temperature, current, and voltage. This ensures that the user can always get the best results. The machine is also equipped with multi-point measurement facilities for measuring the sputtered material. This helps assure that the desired thickness and homogeneity of the thin film is achieved. CANON ILC 1051 has a user-friendly control tool which allows the user to perform real-time adjustments and monitoring of the process. It also provides a built-in data logging feature, allowing for easier storage and retrieval of process results. Additionally, the asset is easy to maintain and offers onsite assistance when needed. ANELVA ILC-1051 sputtering model is an advanced PVD deposition equipment that provides precise, repeatable, and efficient sputter deposition to a variety of applications. The design, advanced features, and top-of-the-line performance make it a reliable and cost-effective solution for all of your thin film deposition needs.