Used CANON / ANELVA ILC 1051 #9156540 for sale

CANON / ANELVA ILC 1051 sputtering equipment is an advanced, high-precision process tool capable of depositing thin films with excellent uniform coverage and step coverage for the fabrication of integrated circuits, data storage and other high-tech devices. CANON ILC 1051 features an integrated sputtering system with a load-lock chamber, integrated RF/DC power supplies, high-vacuum unit and tiltable planar magnetron cathode for DC magnetron sputtering. Additionally, the machine is equipped with a low-pressure, 3 MHz RF bias, providing controllable bombarding power to promote the sputtering process. The low-pressure RF power enhances the uniformity of the sputtered deposition and increases the film's resistance to heat damage. The tiltable planar cathode can reach a temperature of up to 150°C to create a cleaner surface for the deposition process. ANELVA ILC-1051 utilizes the "dual arc" technology with individually adjustable arcs to provide uniformity and reproducible sputtering results. This technique involves two rotating arcs, resulting in higher throughput and improved process quality. With the dual arc technology, the distance between the arcs can be precisely adjusted to enable very thin layer deposition. Additionally, CANON / ANELVA ILC-1051 is equipped with a unique ion acceleration technology which helps improve film quality, adhesion and etching resistance. Furthermore, ANELVA ILC 1051 sputtering tool is designed with a high-speed process controller, comprising a DC power supply, RF power supply, high-vacuum asset and other controls, plus several safety systems for maximum process reliability and maintenance free operation. It also includes a variety of features designed to provide better process precision, fine-tuning capability, simplified maintenance, improved safety and reduce downtime. ILC-1051 controller also operates in a self-monitoring mode and records data for each process to ensure consistent layer thickness throughout the entire deposit. In conclusion, ILC 1051 is a powerful sputtering model designed with advanced, accurate and reliable features for the fabrication of high-tech devices. It features a dual arc technology with individually adjustable arcs for enhanced process quality, an ion acceleration technology for improved film adhesion and etching resistance, plus a high-speed controller with monitoring capabilities and advanced safety systems.