Used CANON / ANELVA ILC 1051 #9219991 for sale

CANON / ANELVA ILC 1051 sputtering equipment is a powerful and reliable sputtering system designed to meet the needs of today's industrial production lines. This advanced sputtering unit enables high-precision thin film deposition within a wide range of sputtering applications. The machine includes the ion source, sputtering chamber, vacuum pump, and control cabinet. The ion source is equipped with a DC magnetron sputtering source, a sealed cathode source and an ion beam source. The sputtering chamber, which is constructed from stainless steel, is large enough to accommodate up to three targets. The chamber has adjustable temperatures, multiple gas injection systems and an adjustable pressure. The vacuum pump, which is attached to the chamber, creates a vacuum to enable the sputtering process to occur. The control cabinet contains the necessary components for controlling, operating, monitoring, and maintaining the sputtering tool. The DC magnetron sputtering source is capable of depositing films at high rates, making it suitable for large-scale production lines. The sealed cathode source allows for extremely high-precision thin film deposition. Its ion beam source produces a focused beam of ions for targeted deposition, allowing for a higher degree of accuracy. The adjustable methane flow ensures uniform deposition at the desired rate. The adjustable temperatures within the sputtering chamber enable the creation of films with various properties. CANON ILC 1051 sputtering asset is a feature-rich industrial sputtering model that enables the creation of thin films with excellent performance characteristics. The ion beam source allows for precise deposition of films, while the adjustable temperatures in the chamber enable the creation of films with various properties. It is the perfect solution for a wide range of industrial production lines.