Used CANON / ANELVA ILC 1051 #9269411 for sale

CANON / ANELVA ILC 1051
ID: 9269411
Wafer Size: 6"
Sputtering systems, 6".
CANON / ANELVA ILC 1051 is a sputtering equipment designed to provide a high quality, accurate deposition of a variety of materials onto various substrates. The system offers a wide range of sputtering technologies, such as DC magnetron sputtering, RF diode sputtering, and direct current ion plating, which allows for high precision thin film deposition with superior properties and performance. The unit consists of a compact but powerful DC power supply, an array of up to three sputter guns, and a vacuum chamber with an adjustable pressure range between 1 x 10⁻¹³ Torr and atmospheric pressure. The vacuum chamber aside, the main components of the machine are integrated on a single platform allowing for a small footprint while providing a robust environment able to withstand the high temperatures and pressures involved in sputtering processes. The DC power supply is capable of delivering up to 0.5kW per sputter gun in current mode or up to 500W per sputter gun in voltage mode for greater precision and higher deposition rates. The sputter guns themselves are an innovative design that uses interior magnetic fields generated by an electromagnetic coil to optimize the plasma focus and higher deposition uniformity. The interior coil can also be powered with additional RF frequency to increase the deposition rate of reactive materials. The interior of the vacuum chamber is populated with sensors to watch pressure, temperature and materials composition. Up to three sputter guns can be installed for simultaneous deposition of multiple materials onto multiple substrates, allowing for the fabrication of layered products. CANON ILC 1051 is one of the most advanced sputtering systems available today. Its combination of advanced technologies, wide range of deposition materials, and automated platforms permits deposition rates up to 4 times faster than standard systems and with superior physical and chemical properties. With high precision and uniformity, and the ability to deposit multiple materials onto multiple substrates, this tool is the optimal tool for production of high-quality sputtered parts and products.
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