Used CANON / ANELVA ILC 1051 #9272190 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

CANON / ANELVA ILC 1051
Sold
ID: 9272190
Wafer Size: 6"
Sputtering systems, 6".
CANON / ANELVA ILC 1051 is a sputtering equipment designed for the deposition of ultra-thin films onto a substrate. In sputtering, a target is placed inside a vacuum chamber and bombarded with ions, which causes atoms on the surface of the target to be released and deposited onto the substrate. CANON ILC 1051 utilizes a Magnetron Inductively Coupled Plasma (MICP) source to generate an argon or rare gas helium plasma in its chamber. The magnetic field generated by the plasma source increases the directional density of the ion beam, allowing for improved coverage and uniformity of film deposition. ANELVA ILC-1051 offers various features to help optimize deposition. It has a vacuum observation window, which allows for diagnostic purposes and can be used to ensure proper substrate positioning and masking. The base pressure of the system is about 1x10-4 Pa and the deposition can reach up to 1x10-3 Pa with a substrate bias voltage up to -2,500V. The temperature can be controlled from room temperature to 300 degrees Celsius. The unit has built-in interlocks to ensure safety and the ability to monitor motors in the machine that move the sputtering gun and the substrate. The tool comes with a cathode feedthroat that allows for gas and/or dose control. An RF generator option is available to provide higher ion densities and enable operation at higher deposition rates. A high capacity turbo pump and a maxigauge pressure gauge provide the necessary backup to maintain and monitor the vacuum chamber. In addition, the window port can be used to install in-situ optical measurement equipment in order to monitor film growth during deposition. The sputtered films deposited using CANON / ANELVA ILC-1051 have good coverage, uniform surface and excellent surface roughness. The films tend to have good adhesion and flatness. The asset is highly reliable and repeatable and can be used for depositing multi-layered films and for various applications, including electronics, MEMS, and optoelectronics. The model also comes with a number of software options that provide remote access to the equipment and other useful features.
There are no reviews yet