Used CANON / ANELVA ILC 1051 #9354461 for sale

CANON / ANELVA ILC 1051 is a state-of-the-art sputtering equipment used to deposit advanced thin films onto a substrate. It is a dual-chamber, high-vacuum configuration sputter system that provides an ideal platform for creating conformal and high-resolution thin films. It is capable of sputtering metals, insulating materials, dielectrics, and other sputterable materials with both high- and low-energy plasma sources. CANON ILC 1051 has a wide range of sputtering options, with up to six cathodes capable of sputtering simultaneously, making it an excellent choice for large-scale projects as well as smaller laboratory projects. It also includes adjustable power, frequency, current, and gas flow options, allowing it to achieve the desired results for a variety of thin film applications, including sputtering oxides, nitrides, carbides, and a wide variety of metals. The sputtering unit is powered by a Patent Diamind-Coated Sputtering Gun (PDSG). It is an ultra-high vacuum (UHV) sputter machine, designed to produce simulation-ready thin films of the highest quality and uniformity. The PDSG has a rotating arc pallet and sputtering source, allowing it to provide very precise sputtering of very thin films while avoiding burning of the target material. The sputtering tool also features an advanced vacuum-based throttle asset, allowing it to provide a consistent deposition rate and facilitate targeted sputtering of material up to three micrometers in thickness. It is also equipped with an inert gas delivery model, providing a low-oxygen environment for sensitive thin films. ANELVA ILC-1051 sputtering equipment is an ideal tool for producing advanced thin films, with a wide range of features designed to ensure the highest possible quality results. It is suitable for creating thin films for a variety of semiconductor applications, as well as other industries, such as automotive and medical, making it a versatile sputter tool.