Used CANON / ANELVA ILC 1060 #293642935 for sale

CANON / ANELVA ILC-1060 is a single-source sputtering equipment designed for substrate deposition in the production of thin-film materials. The system uses a single sputter cathode to evenly deposit a thin layer of material onto a substrate. CANON ILC-1060 has a base chamber size of 200 x 200 x 100 mm, making it suitable for small-scale deposition applications. The sputtering chamber of ANELVA ILC 1060 is fitted with an electron gun, a geometry manipulator, a magnetron sputter gun, and a digital control board. The electron gun is used to provide a negative charge to the surface of the material to be sputtered, while the geometry manipulator controls the shape and angle of the sputtered material. The magnetron sputter gun ensures uniform deposition on the surface of the substrate, while the digital control board is used to set the deposition rate and the power of the sputter gun. CANON ILC 1060 is ideal for thin-film deposition applications such as super-hard coatings and diamond-like carbon (DLC) coatings, due to its precise and consistent deposition properties. Its precise deposition control allows for uniform and repeatable sputter deposition in even the hard-to-reach areas of a substrate. ILC-1060 has a maximum sputter deposition rate of 10 nm/min, making it suitable for even the most demanding thin-film production applications. The unit is also equipped with a temperature control machine, ensuring precise and stable temperature control while the deposition process is on-going. A water cooling tool is also included, which helps to regulate the temperature in the sputtering chamber and reduce errors caused due to thermal expansion. ANELVA ILC-1060 is a reliable asset perfect for thin-film deposition applications. It is easy to use, with all its components and settings clearly visible, and its programmable settings ensure consistent and accurate sputter deposition on any material. What's more, its affordability makes it an ideal option for companies looking for a cost-effective sputtering model.