Used CANON / ANELVA ILC 1060 #293643632 for sale

CANON / ANELVA ILC-1060 is a sputtering equipment used to deposit thin films of metal or other materials on a substrate. This system is a dual-chamber unit comprising a loadlock chamber, a high-frequency power source, and a chamber where magnetron sputtering takes place. The loadlock chamber allows for the substrate to be loaded and unloaded without exposing it to the environment, maintaining a high vacuum in the sputtering chamber. The high-frequency power source is used to cause the magnetrons or other sputtering sources in the machine to emit a plasma over the surface of the target material to be sputtered. This plasma is composed of electrically excited ionized particles, which bombard the target material, dislodging atoms and molecules which are then deposited onto the substrate as a thin film. The chamber where magnetron sputtering takes place consists of an RF power source, a vacuum pump, and a circulating gas tool. The RF power of up to 10,000 watts can be used to achieve a maximum pressure of 3 x 10-3 Pa, ensuring uniform sputtering of the target material over the substrate. The vacuum pump is used to maintain a constant pressure in the chamber, and the circulating gas asset ensures uniform ionization over the substrate. CANON ILC-1060 model is capable of sputtering a variety of materials onto a wide range of substrates, making it suitable for a range of applications such as the manufacture of integrated circuits. The equipment also includes diagnostic tools that enable the user to monitor the deposition process, allowing for precise parameters to be adjusted to meet specific application requirements. Furthermore, this system is easily expandable, allowing for multiple sputtering sources, and has a low maintenance requirement.