Used CANON / ANELVA ILC 1060 #293643635 for sale

CANON / ANELVA ILC-1060 is an advanced sputtering equipment designed for the deposition of thin films onto substrates. This system is capable of multilayer sputtering, allowing for deposition of very thin films with outstanding reproducibility. CANON ILC-1060 is capable of depositing both high purity and highly oxidation-resistant single-layer and multilayer thin films. The sputtering process is based on a repeating cycle of ion bombardment and ion bombardment reaction. The primary method used is magnetron sputtering. The unit's advanced vacuum chamber employs several technologies to enable ultra-high vacuum and high quality deposition. RF plasmas, integrated ultra-high vacuum technology, and ion extraction mechanisms are used in the chamber to enable deposition of ultra-fine particles and uniform layers of film. ANELVA ILC 1060 also offers a range of gas management options, allowing users to easily set and control different gas flow rates, depending on the process and film desired. Multiple gas inlets can be used at different temperatures and volumes; these are all easily adjusted and monitored by the control panel. ANELVA ILC-1060 is ideal for use in fast production and ultra-precision deposition. Its sophisticated control software enables fast, accurate, and reproducible deposition. Additionally, the unit is designed with a low-noise, low-vibration design that allows for deposition even in laboratory settings. The machine's fully automated features help to minimize labor and time requirements, making it a fast, effective and reliable sputtering tool. Advanced closed-loop process control, real-time monitoring, and feedback systems make it possible to easily maintain process parameters and ensure a consistent, high quality result. ILC-1060's programmable automated recipes make it simple to perform repeatable film deposition with minimal labor. In conclusion, CANON / ANELVA ILC 1060 is an advanced sputtering asset designed for deposition of single- and multilayer thin films with high precision. Its sophisticated control software and automation makes it a fast and reliable sputtering model suitable for laboratory settings. Its multiple gas management options, advanced process control and real-time monitoring capabilities make it a highly versatile equipment that's ideal for producing high quality thin films with reproducibility and accuracy.