Used CANON / ANELVA ILC 1060 #293643641 for sale

CANON / ANELVA ILC 1060
ID: 293643641
Wafer Size: 8"
Vintage: 1994
PVD Sputtering system, 8" 1994 vintage.
CANON / ANELVA ILC-1060 is a high power, sputtering equipment designed for deposition of superior quality thin films on a broad range of substrate materials. It incorporates the use of multiple cathodes, enabling high throughput and the deposition of uniform films of high purity materials. CANON ILC-1060 is equipped with an auto-compensation power supply, allowing unprecedented control of the power and uniformity of the film. The system also features a pressure control function, allowing precise and stable operation of the sputtering unit. Additionally, ANELVA ILC 1060 is equipped with a digital vacuum control machine, which adds to the uniformity and quality of the films. CANON / ANELVA ILC 1060 utilizes two powerful embedded magnetrons, providing a high level of sputtering deposition. Both of the magnetrons feature a short cylindrical magnetron target design, which increases the sputtering rate of film deposition by providing a uniform and isotropic magnetic field. The targets are adjustable to accommodate both large and small area substrates. Additionally, external, positionable magnetron targets can be added to CANON ILC 1060, to enable more advanced processes such as PVD (Physical Vapor Deposition). ILC-1060 is capable of handling a wide variety of deposition materials, including metals, compounds, insulators, and alloys. Its two target stages allows for multiple material layers to be sputtered onto a single substrate. The high power substrate heaters allow for both conventional and low temperature deposition of inconvenient materials, enabling large temperature control for uniform deposition of dielectrics and ceramics. Overall, ANELVA ILC-1060 is a reliable and versatile sputtering tool, optimized for the deposition of high quality and uniform thin films. Its multiple cathode design, digital vacuum control asset, magnetron configuration, and adjustable substrate settings allow for precision and accuracy in thin film deposition. This model is ideal for any refined surface technologies where thin film deposition is essential.
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