Used CANON / ANELVA ILC 1060 #293643642 for sale

CANON / ANELVA ILC 1060
ID: 293643642
Wafer Size: 8"
Vintage: 1993
PVD Sputtering system, 8" 1993 vintage.
CANON / ANELVA ILC-1060 sputtering equipment is a versatile and efficient sputtering system for the production and deposition of thin film materials. It is built on a modular design, with multiple power supplies, heatsinks, and sputtering targets. The unit surpasses other similar systems in terms of speed and performance, allowing for faster processing and greater precision. The stainless-steel bell-type chamber is capable of accommodating a variety of configurations, including dual-deposition and planar targets. CANON ILC-1060 features multiple dual-axis motion control systems that enable precision deposition control, as well as a high-resolution optical flatness control machine that ensures thin-film deposition uniformity. The tool's integrated process control systems monitor the deposition process and ensure optimal and consistent results. The substrate heating asset is able to deliver heat up to 1500C, making it suitable for the processing of a wide range of thin-film materials. ANELVA ILC 1060 is equipped with a four-channel gas distribution model, allowing up to four gases to be introduced into the chamber, allowing for a variety of processes and configurations. The equipment also features a digital pressurized-gas control system that can be set for low or high pressure process control, enabling precise and uniform deposition. CANON / ANELVA ILC 1060 also includes full unit diagnostic capabilities, allowing users to monitor and diagnose any potential issues or discrepancies during operation. It also features automated recipe management, enabling users to quickly and easily switch between various process recipes without manually setting each parameter every time. ANELVA ILC-1060 is a reliable, powerful, and efficient sputtering machine, allowing users to produce and deposit thin film materials with speed and precision. Its modular design, dual-axis motion control, and full diagnostic capabilities make it a superior tool for a wide range of thin film deposition applications.
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