Used CANON / ANELVA ILC 1060 #293749178 for sale

CANON / ANELVA ILC 1060 is a high performance sputtering equipment designed for a variety of applications in thin film deposition. This system is capable of supplying a stream of ions generated from a noble gas such as argon, krypton, and xenon to a target material, typically a metal or a ceramic. The ion bombardment helps strip away atoms of the target material and deposit them, in the form of a thin film, onto the substrate. In the case of CANON ILC 1060, a direct current (DC) indirect linear cascade configuration is utilized to impose a voltage potential on the sputter column, thereby generating a charged noble gas plasma. ANELVA ILC-1060 unit offers a wide range of power, voltage, and flow rate settings to precisely control sputtering performance. The power source comprises an arc core DC power supply and a DC magnetron sputtering magnetic field. For high rate deposition and improved sputter yield, the external magnetic field settings are adjustable over a wide dynamic range. The high-frequency generators of the device enable a frequency modulation of the process in order to maintain a stable plasma state. ILC 1060 machine also includes advanced deposition process controls for precision deposition of thin film coatings. It is equipped with a multi-channel temperature monitor to control the substrate and target temperatures, as well as a multi-zone environmental monitoring tool to detect any changes in the environment and trigger an automatic shut down procedure to prevent contamination if necessary. To ensure repeatability and high quality results, ANELVA ILC 1060 is also designed with accurate target and substrate distance and tilt control devices, which enable precise uniformity in material deposition. Its control console accurately monitors and records both vacuum parameters and process parameters throughout the process cycle. In summary, CANON / ANELVA ILC-1060 is a highly advanced sputtering asset designed to meet the needs of those requiring high production levels of accurate, repeatable and reliable thin film coatings. Its advanced power, voltage, flow rate and deposition process controls, its multi-zone environmental monitoring model and its accurate distance and tilt control devices all help to ensure high quality deposition every time.