Used CANON / ANELVA ILC 702 #293657154 for sale

CANON / ANELVA ILC 702
ID: 293657154
Wafer Size: 6"
Sputtering system, 6".
CANON / ANELVA ILC 702 is a high-precision magnetron sputtering equipment used for producing thin-film coatings of high accuracy and uniformity. This system is capable of depositing films on various substrate materials, including metal, plastic, glass, and ceramics. CANON ILC 702 unit is able to perform sputter deposition at a wide range of pressures, from normal atmospheric pressure to vacuum. This is done using a high-powered dc magnetron sputter gun, which uses a magnetically-enhanced vacuum to near-vacuum chamber with a working pressure of 10-2 to 20 mTorr, and can operate at temperatures from 0°C to 800°C. In addition, it includes a high voltage power supply, an electron beam gun, and a gas injection machine. ANELVA ILC 702 tool is equipped with a motor drive unit for precise control of the sputter gun. This unit is capable of producing a constant angular velocity, ensuring uniform deposition on the substrate. The motorized rotary base moves the sputter gun on two horizontal axes to enable sputtering of large targets and convoluted surfaces. The motion of the sputter gun is accurately monitored by the asset's optical sensors. ILC 702 model is designed for high accuracy and uniformity of the deposited films. It has a sputter deposition speed of up to 0.3m/min, and a sputter rate of up to 1.2nm/s. The uniformity is achieved by the high-powered magnetron sputter gun and the rotating base. The equipment also includes a gas injection system for controlling the gas pressure in the vacuum chamber. This is done to ensure uniform flow of the gas in the chamber and to ensure the desired dielectric material properties. The unit also includes an auto deposition chamber, where the substrates are placed for the sputtering process. This chamber is designed with high precision walls and equipped with a high-efficiency filter machine. This helps to ensure a dust and particle free environment and an oxygen-free environment for the sputtering process. In addition, different wall types are also available to further increase the uniformity of coatings. CANON / ANELVA ILC 702 tool is ideal for thin-film depositions in applications such as electronics, optoelectronics, MEMS, aerospace, and medical devices. It includes a range of features which enable easy operation and precise control, making it suitable for applications requiring accuracy and repeatability.
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