Used CANON / ANELVA L-332S-FHL #9048857 for sale

CANON / ANELVA L-332S-FHL is a sputtering equipment designed for precise and efficient deposition of thin films. This system is particularly well-suited for applications in electronics, optoelectronic, and automotive industries due to a combination of features, including a superior sputtering rate stability as well as an easy-to-use operation unit. The sputtering machine features an evaporation type carbon dioxide laser and an RF inductively coupled plasma source for releasing and depositing material on a target. It also has advanced control systems that enable precise control of the sputtering pressure, deposition rate, and other parameters. The tool has a maximum sputtering rate of 200 nm/min and a sputter angle of 60°. The asset also has anlarge, automated control circuitry with a range of settings, allowing complex deposition operations with ease. One key advantage of the model is the ability to run high-coverage deposition operations that significantly reduce the amount of process time and increase throughput. The equipment also has a variable power supply that supports sputter frequencies of up to 100 Hz for even better results. In addition, the system is designed with safety features, such as over-temperature protection and an emergency shut-down circuit, that help prevent against potential damage to the components. The unit also features a robotic arm with a gripper that allows for easy loading of substrates and targets. CANON L-332S-FHL is a highly capable and efficient sputtering machine that is designed for precise deposition of thin films. Its superior sputtering rate stability and ease-of-use make it an attractive choice for many applications in electronics, optoelectronic, and automotive industries. The tool's advanced control systems and safety measures help to ensure the highest quality thin films are created every time.