Used CANON / ANELVA L-400EK-L #9372506 for sale

CANON / ANELVA L-400EK-L is an automatic sputtering equipment designed for large-scale production that combines high-precision sputtering deposition technology and a sophisticated vacuum chamber into one efficient system. Its advanced design provides excellent uniformity of thin films deposited at very high deposition rates with low chamber leakage rate, extreme reliability and low maintenance costs. CANON L-400EK-L sputtering unit consists of four main components: the sputtering chamber, the sputtering source, the vacuum machine, and the process control tool. The vacuum chamber is made from stainless steel and is capable of reaching ultra-high vacuum, making possible the efficiently deposition of ultra-thin films. The process chamber is equipped with a fore pump, a roughing pump, an ion source, and a turbo pump. The high-capacity fore pump helps to reduce the vacuum to the required working level quickly, while the roughing pump maintains a constant pressure throughout the process. The sputtering source is an atmospheric-type DC source with a maximum power adjustable up to 400kW. It is equipped with up to 40 sputter guns that can simultaneously deposit thin films on various substrates. The sputtering process is highly reproducible and offers excellent homogeneity across the sample surface. ANELVA L-400EK-L features an automated control asset for precise monitoring and control of the sputtering process. The sophisticated control model enables you to precisely control the parameters and conditions according to your desired values. The equipment is also highly adaptive and can adjust to sudden changes in the sputtering conditions, ensuring that uniform and even depositions are achieved. Overall, L-400EK-L system is an efficient and reliable sputtering unit for large-scale production. Its advanced design and sophisticated control machine make it ideal for the deposition of high-precision metallic and semiconductor thin films at an excellent uniformity and deposition rate. Its excellent cost-to-performance ratio makes it one of the most popular sputtering systems available in the market today.