Used CANON / ANELVA L-430S-FHL #9107299 for sale

CANON / ANELVA L-430S-FHL is a sputtering equipment designed for coating the surfaces of materials with a thin film layer of a metal or other material. It is widely used in industries such as semiconductor, automotive, aerospace, medical device, optics, and renewable energy. The machine consists of a compact front support unit, an independent rear platform, a top platform for substrate (workpiece) transport, and two ion source arms. It is equipped with a four-axis automatic sputter source alignment system, three independent rotary target holders, in-situ pumping unit for ultra-high vacuum (UHV) operation, and an automated sample shutter mechanism. The sputter source offers high power and coating uniformity, and is capable of coating up to four different materials. The machine is highly efficient and is equipped with a fast-scanning laser interferometer, enabling precise sputter target tracking and alignment. The fast-scanning function ensures superior uniformity of sputtered films. CANON L-430S-FHL also provides high sustained deposition rates and is rated to operate at pressures lower than 3.0x10-4 torr. The tool is capable of precisely controlling the deposition rate, sputter angle, ion concentration, and electrode current to optimize the process results. ANELVA L-430S-FHL is also designed with a wide range of features to ensure the user's safety during operation. The machine has a two-step arc power control, automatic door closing, remote emergency button, grounding cable, fire extinguisher, and other safety features. The machine has an easy-to-use design and is equipped with several data logging and monitoring systems to facilitate accurate process tracking and optimized process control. The machine has also been designed to connect to manufacturing systems to facilitate automated production processes. Overall, L-430S-FHL is an advanced sputter asset designed to provide users with optimal film deposition performance on a variety of substrates and materials. It is designed for precision and accuracy coupled with safety and usability. This unit is ideal for applications such as research and development, production-level sputtering of optical films, and process optimization.