Used CANON / ANELVA SPC-530H #9111244 for sale

CANON / ANELVA SPC-530H is a high-performance sputter equipment designed for deposition of thin films. It is equipped with a 500 W, radio-frequency (RF) sputter power supply and a low-pressure, direct-current (DC) glow discharge power supply. CANON SPC-530H system offers excellent process control through a real-time microprocessor-based unit that monitors and controls the set points for sputter rate, glow discharge conditions, and dwell time between cycles. The sputtering power supply works over a wide frequency range (50-4,000 kHz) and is capable of processing substrates up to 8" in diameter. ANELVA SPC-530H machine is designed for fast sputter deposition and fast material transfer to and from the sputter chamber. SPC-530H tool offers a broad range of sputtering processes in a single asset, including ion beam etching, reactive ion etching, surfactant deposition, evaporation, and magnetron sputtering. Its flexibility and scalability allow for a wide range of substrates and sputtering parameters. CANON / ANELVA SPC-530H model includes an adjustable chamber pressure control equipment that enables a precise control of the process parameters, such as deposition rate and film thickness. Furthermore, CANON SPC-530H system supports an auto-clean and auto-drifter features, which facilitate longer deposition times and faster deposition rates. ANELVA SPC-530H unit can produce a wide range of film types, from oxide films to high-temperature semiconductor dielectrics. Its broad range of sputtering processes allows for fine-tuning of the deposition rate to give the desired results. Moreover, SPC-530H machine features a unique high-temperature substrate heating option, which enables deposition of films with superior properties. Additionally, the tool supports in-line optical inspection, which allows for quality control of the films produced. CANON / ANELVA SPC-530H asset is designed for long-term use and reliability. Its closed-loop processing ensures precision measurements and tight process control. The automated procedures for chamber maintenance and cleaning eliminate the need for manual adjustments and decrease the process costs. In addition, the user-friendly software and graphical interface allows for easy and efficient control over the model's functions. Overall, CANON SPC-530H is a versatile and reliable sputtering equipment designed for high-performance deposition of thin films. Its broad range of sputtering processes, accompanied by advanced features such as auto-clean and auto-drifter, allows for fast and precise deposition of thin films with excellent reproducibility. Moreover, the system features a unique high-temperature substrate heating option, which facilitates deposition of high-temperature films with superior properties. The unit supports high-speed deposition, making it suitable for production of thin films with precise and repeatable results. In addition, its user-friendly interface enables quick and easy control of the machine's functions.