Used CANON / ANELVA SPC-530H #9111247 for sale

CANON / ANELVA SPC-530H is a high-performance sputtering equipment designed for industrial use. It combines two components: a plasma-based magnetron sputter source and a chamber for creating a vacuum environment. The plasma-based magnetron sputter source uses an electron shower to excite a gas mixture of argon and oxygen that creates a plasma, providing an energetic and uniform entity to bombard a substrate surface. The crystalline structure of the surface is then changed through bombardment of atomic species. The chamber for CANON SPC-530H is designed to provide a vacuum environment, allowing deposition of material on the substrate to occur under space-like conditions. With an ultimate pressure of 1x10-6 Pa, the chamber is designed with an external booster pump in order to maintain the desired vacuum environment. In addition, the chamber is equipped with a vacuum line, piping, and valves to ensure the integrity of the chamber and maintain optimal performance. ANELVA SPC-530H has multiple features, such as an ion source, which assists in being able to control film deposition by controlling the ionization of an atom and a source power detector, which helps monitor the process and emits feedback to maintain the desired film deposition. Furthermore, SPC-530H includes a plasma monitoring window, which allows observation of the plasma in the chamber and allows for further fine tuning of the process. Overall, CANON / ANELVA SPC-530H is an advanced sputtering system designed for industrial use. It combines a plasma-based magnetron sputter source and a chamber for providing a vacuum environment. The unit is equipped with features such as an ion source, a source power detector, and a plasma monitoring window, allowing for precise control of the deposition process. With its advanced features, this machine is widely used in the semiconductor and automotive industries, providing users with high-precision, reliable, and cost-effective results.