Used CANON / ANELVA SPF-210H #9284046 for sale

CANON / ANELVA SPF-210H sputtering equipment is a highly efficient system used to manufacture thin films, oxides and multi-layer structures. It utilizes a high-frequency RF power source to coat a target material with an inert gas. A DC bias is applied to the substrate to create a uniform film. CANON SPF-210H is composed of a main chamber, target, two power supplies, a DC bias power supply, a magnetron discharge source, and a vacuum chamber. The main chamber is temperature controlled to ensure uniform film deposition. The target material, such as aluminum or other metal, is held in place in the sputtering chamber by high-performance magnets, which act as a magnetic bottle. This allows for large-area and uniform target sputtering. The surface of the target is bombarded by a high-frequency RF signal which causes sputtering, or a plasma detachment of target material. The signal is generated by a magnetron discharge source. The four-quadrant DC bias power supply provides for high deposition rates. Sputtered particles remain charged and the DC bias serves as an accelerator that pushes charged particles into the substrate. The substrate is placed in the chamber and temperatures are maintained to ensure uniform and robust film deposition. The chamber is a vacuum chamber that is pumped down to 1 Torr in order to provide a high-quality film deposition process. ANELVA SPF-210H also utilizes a high-efficiency pumping unit to maintain the chamber's pressure during the sputtering process. In addition, the injected gas is well mixed and kept at a steady flow rate, producing reproducible and reliable films. SPF-210H is ideal for fabrication of oxide and multi-layer films. It is a compact and easy to use sputtering machine, which requires little maintenance and is capable of producing uniform, robust films over large areas without the need for complicated polishing processes. CANON / ANELVA SPF-210H is excellent for many applications, including sputtering of various metals, transparent conductors, ceramic materials, and optically thin films.