Used CANON / ANELVA SPF-410H #9048859 for sale

CANON / ANELVA SPF-410H is a high-precision sputtering equipment designed for creating thin film coatings on a variety of substrates. The system consists of four main components: a main chamber, power supply, magnetron gun, and various detectors. The main chamber is the chamber in which the substrate or material to be coated is placed. The chamber is equipped with an inert gas supply and a vacuum monitoring and control unit. The power supply is the component responsible for providing the voltage to create a plasma. The power supply is set to a certain level to ensure that the plasma density is appropriate for the sputtering process. The magnetron gun is the component in the machine that creates an intense magnetic field, thus giving the ions a path to travel through the vacuum. The various detectors measure the plasma density, ion flux and other parameters that need to be monitored. The tool has a variable power source, making it suitable for different types of sputtering processes. The power supply can generate between 0 and 2000V, and can be set at different frequencies, ranging from DC to 120 KHz. This allows it to be used in processes such as reactive sputtering, ion vapor deposition and cathodic arc evaporation. The versatility of CANON SPF-410H makes it a suitable choice for many different applications. The asset's superior vacuum and plasma stability allow it to be used in processes such as optical coatings, semiconductor manufacturing, and thin film deposition. The high accuracy of the model also allows it to be used for precision sputtering processes such as MEMS, semiconductor devices, and photodetectors. Long-term operation of the equipment is maintained by an array of feedback sensors. These allow for the adjustment of the chamber pressure to maintain the desired deposition rate, the adjustment of the plasma density to prevent contamination, and the evaluation of the target area to monitor the operation of the system. ANELVA SPF-410H offers a wide range of features, ensuring that it is a reliable and precise sputtering unit. The machine's powerful power supply, superior vacuum and plasma stability, and versatile detectors make it a suitable choice for a variety of thin film applications.