Used CANON / ANELVA SPF-510 #9148249 for sale

CANON / ANELVA SPF-510 is an advanced thin film deposition equipment designed for sputter deposition of metal and dielectric thin films. The system is optimized for thin film deposition on flat sufaces as well as curved surfaces. CANON SPF-510 features a UHV chamber with a 6" circular deposition area and four 1 inch MN source guns. The unit is capable of high throughput thin film deposition with process temperatures up to 800 °C. The machine is designed for use in a variety of scientific research field, including materials science, microelectronics, MEMS/NEMS, and thin film solar cell. ANELVA SPF-510 features a high purity pumping tool with an all-metal gate valve that allows low chamber pressure operation as low as 1 × 10 -3 Pa. The asset is also equipped with a real-time chamber pressure monitor for optimal process control. The source guns of the model feature a high efficiency source power supply, which provides a wide range of sputter powers from 500 W to 5 kW. This allows fast deposition rate (up to 10 nm/s) with excellent homogeneity and uniformity. The equipment can be used with large substrates such as flat wafers and tube-like substrates up to 25.4mm in diameter. In addition to sputter deposition, SPF-510 also supports reactive sputtering. The system features a protected RF power supply for advanced process control and uniformity. The unit is equipped with a multi-channel proportional metric controller, which allows for full-scale regulation of the sputter process parameters, such as target thickness, deposition rate, and pressure. CANON / ANELVA SPF-510 is easy to install and operate. The machine comes with an intuitive user interface that allows for quick process parameter setting. The tool is designed for reliable and stable operation in a production environment. Additionally, the asset features a high-performance digital feed-forward closed-loop temperature control model for precise and repeatable processing. Overall, CANON SPF-510 is an advanced sputtering equipment designed for high-throughput thin film deposition. The system's features allow for precise process control for the deposition of metal and dielectric thin films. The unit is easy to install and operate, and is ideal for a variety of thin film deposition applications.