Used CANON / ANELVA SPF-540H #9053829 for sale

CANON / ANELVA SPF-540H
ID: 9053829
Sputtering system.
CANON / ANELVA SPF-540H sputtering equipment is a precision sputter deposition system designed for use in many different applications. With its advanced design, this advanced unit is capable of accurately processing thin films on a variety of substrates with its precise control of parameters such as composition, texture, and morphology. This unique machine can be used for many types of applications, including manufacturing of high-end research and production tools. CANON SPF-540H unit includes a deposition chamber which houses a three-chamber rotary magnetron, a power supply, an ion source, an sputtering target, and a DC power source with a polygonal/rotating substrate holder to hold the substrate in place during the deposition process. The unit also includes a spin-on-glass and pyrolytic glass. It can be used in a variety of processes from thin film deposition to large area monolithic CVD processes. The power source is configured to control the intensity of the DC pulse for both sputtering and ion sources, and is capable of a wide variety of output voltages, current ranges, and cycle rates. The chamber can handle temperatures up to 1000°C for the process, and the target is able to rotate relative to the substrate. The rotary magnetron is able to provide a uniform deposition across the substrate, and the ion source can be programmed for a variety of deposition profiles. The deposit can be monitored on the substrate during the deposition process, and the sputtering source can be programmed for a variety of compositions. This tool is also compatible with numerous types of monitoring software, allowing for easy, real-time monitoring of the process. Additionally, it is possible to operate ANELVA SPF-540H in a remote fashion, meaning that the asset can be monitored and controlled from a remote location. Overall, SPF-540H is a powerful, versatile sputter deposition model. It is suitable for a variety of applications and can accurately process thin films on a variety of substrates. Its advanced design and ability to monitor and operate from a remote location make it an ideal tool for a variety of users.
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