Used CANON / ANELVA SPF-730 #9284116 for sale

CANON / ANELVA SPF-730 is a sputtering equipment that can be used for various applications such as thin film deposition, film deposition, microscopic analysis, instrumentation, tribology, and sample preparation. CANON SPF-730 features a 24" diameter, 24" long stainless steel process chamber and is designed to run under a vacuum of 10^-5 Torr. It is equipped with built-in gas inlets, an eight-part crystal target holder, and a single-point magnet for uniform magnetron sputtering. The sputtering system has a maximum power level of 2kW with an operating degree of 100 W to 1.2 kW. There are also 12 adjustable current ranges up to 100 mA and five rotation shift settings, which enable precise control of the sputtering process. The unit's chamber is designed to accommodate samples up to 12 inches in diameter and 40 pounds in weight. It also offers access for external tools including sample holders, cutters, torches, and microscopes. A mini-furnace and a temperature controller can be installed on the machine for thicker deposition. ANELVA SPF-730 is equipped with a built-in plasma tool with an etching chamber, a susceptor-controlled RF-plasma source, RF matching network, and a controller for magnetron sputtering. The asset can also be equipped with an infrared detector for monitoring the film deposition during process development or research. SPF-730 is a reliable and efficient sputtering model suitable for a wide range of applications. Its easy-to-use control equipment and broad capability makes it an ideal choice for research laboratories, thin film deposition, sample preparation, and instrumentation.