Used CANON / ANELVA SPF-730H #9284123 for sale

CANON / ANELVA SPF-730H sputtering equipment is a versatile and advanced piece of machinery designed for the deposition of various thin films through the energetic bombardment of a sputtering target. This sputtering target, typically made out of a metallic alloy, is placed in a vacuum chamber which is then filled with an inert gas such as argon. The chamber is then heated up to a set temperature, and a high voltage and current are introduced into the chamber. This results in the generation of an electric field, which in turn causes the inert gas atoms to become ionized and accelerated towards the sputtering target, where they bombard the target and sputter off atoms of the material into the chamber. These sputtered atoms then condense on the substrate below, thereby creating a thin film of the target material on the substrate. CANON SPF-730H sputtering system is an integrated, multifunctional unit ideal for use in a variety of thin film deposition processes. It features a superior level of control over the sputtering process, ensuring uniform and repeatable thin film deposition. It also includes a number of advanced features such as pressure pulse control, target angle control, target reflex control, and computer controlled operation. In addition, ANELVA SPF-730H sputtering unit offers excellent performance and includes components that are durable and easy to maintain. SPF-730H sputtering machine offers a wide range of substrate sizes and materials, allowing users to easily create thin films with various properties and applications. Additionally, the tool allows for a variety of target materials to be used in the sputtering process. Different combinations of target and substrate materials result in films with different properties. As such, CANON / ANELVA SPF-730H sputtering asset is an ideal model for a variety of thin film deposition processes. Overall, CANON SPF-730H sputtering equipment is a robust and reliable piece of machinery designed for the deposition of thin films. It offers a range of features and settings that allow for quite precise control over the sputtering process. Thanks to its versatility and advanced features, it can be used for a wide range of thin film depositions and is therefore a popular choice for many research, industrial, and academic applications.