Used CANON TOKKI CR 099 #9143788 for sale

CANON TOKKI CR 099 is a sputtering equipment designed to deposit thin-films of materials onto a range of workpiece materials. The system can be used for various kinds of sputter deposition processes, including high-rate, low-pressure physical vapor deposition (HRLP-PVD) and low-pressure chemical vapor deposition (LPCVD). The unit is powered by a high-voltage DC power supply, and utilizes ARC, EOS and C8070 Inverters to precisely control the sputtering process. The ARC and EOS Inverters provide the ability to control the temperature and power of the sputtering process independently, while the C8070 provides additional current control and frequency control capabilities. The machine also includes an Advanced Process Monitor (APM) tool which monitors and records process parameters. CR 099 includes three different chambers: a main vacuum chamber, a second heating chamber, and a third cooling chamber. The main chamber has a working volume of 2.1m3 and an operating pressure range of 1.0 to 2.0 Pa. Inside the main chamber, a rotary magnetron sputter source is used to sputter the target material onto the workpiece. The second and third chambers are equipped with heating and cooling systems respectively, and are used to control the deposition rate and temperature of the sputtered material. In addition, the asset includes an automatic loading model which allows the sputtering process to run continuously without the need for manual labor. The equipment is equipped with the necessary safety features, such as a pressure limit and thermal protection functions. CANON TOKKI CR 099 is capable of producing films with a thickness ranging from 0.3 to 40µm, with an impressive uniformity of +/- 5%. The system is also designed for a wide variety of material compositions, including metals, ceramics, and polymers. It also offers a wide range of process parameters, including rate of deposition, distance from the workpiece, and unit power. Overall, CR 099 sputtering machine is a reliable and effective solution for the deposition of thin-films. As a result, it is widely used in a variety of industries, ranging from semiconductor manufacturing, photovoltaic cells, and display production, to medical and optical applications.