Used CPA / KURDEX 9900 #9035084 for sale

Manufacturer
CPA / KURDEX
Model
9900
ID: 9035084
Sputtering system Manual operation Cold trap in each chamber Load lock at each end Substrate heater chamber (3) Cathode chambers Cathode size: 15" Diffusion pumps model #0183 (VHS-4 new model number) for the load locks Turbovac 1000CT Turbo pump for the process chamber System handles 14 pallets in a load, 12"x12" usable pallet area Equipped in each load lock a heater enclosure and an omega temperature controller for high temperature cures (=<500C) at high vacuum.
CPA / KURDEX 9900 is a high-performance sputtering equipment designed for nanotechnology and material research. It is a compact, non-vacuum, high-rate plasma system, which features various energy sources and a wide range of customizable user-configurable parameters. The unit is built on a modular platform, with a controller, power supply, gas feed, target holders, a broad range of targets, collimate baffles, vacuum chamber, and viewports. CPA 9900 utilizes high power pulsed plasma technology to produce a high-rate, repeatable sputtering process to deliver a gas-phase deposit of thin-film material onto a substrate with minimal defects. The uniform, high rate sputtering provided by this machine ensures quality deposition of thin films with excellent adhesion and uniformity. Additionally, the tool can be used to deposit films for a wide range of applications, including semiconductor structures, optical coatings, and biomedical devices. The power of KURDEX 9900 is provided by a wide range of energy sources, including magnetrons, arc plasma sources, and e-beam guns. The control and monitoring systems allow for precise adjustment of plasma parameters, such as power, gas composition, and pulse width. It also features customizable working parameters, such as temperature, pressure, cool-down time, and pressure mode. This gives users the ability to tailor the sputtering deposition to their specific requirements. 9900 asset is equipped with a range of safety mechanisms to ensure safety during the sputtering process. These measures include spatial temperature-independent over-temperature shutoff, targeted area thermal protection, and level-sensitive arc initiation control. The model also features a 'target poisoning' equipment, which reduces the reaction between the evaporated particles and the substrate, as well as from interfacing with surface contaminants. Overall, CPA / KURDEX 9900 sputtering system is an efficient, repeatable, and highly controllable unit for nanotechnology and material research. This machine is capable of producing thin-film depositions with excellent quality and uniformity for materials with a wide range of properties and applications. The user-friendly interface, coupled with the range of customizable parameters, makes CPA 9900 sputtering tool an excellent choice for any research or industrial sputtering application.
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