Used CPA / KURDEX 9900 #9053543 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

Manufacturer
CPA / KURDEX
Model
9900
ID: 9053543
PVD Inline Sputtering system Single linear chamber configuration (4) DC magnetron sputtering stations Pallet and chain wafer transfer (2) Heated loadlocks capable of handling 8 plus pallets, capable of handling up to 8” Cryo pump: CTI 10 Not included: Cryopump compressor MDX-10 DC Power supply.
CPA / KURDEX 9900 is a high-precision, multi-functional sputtering equipment designed to provide precise and reliable processes for thin film deposition on a variety of substrates. It incorporates an advanced cross-beam source design for sputtering with a cathodic arc deposition source, allowing for a range of high-performance, custom thin-film deposition capabilities. The system has a wide variety of process and process control features, including a choice of programming protocols and an integrated control unit. The machine consists of three main components: the sputtering chamber, the cathode-arc source, and the protective enclosure. The sputtering chamber, which uses computer-controlled valves for gas fill, has an ultra-low background pressure when required. It is also equipped with a modern vacuum tool designed to maintain stable vacuum levels within the reaction chamber. The chamber also contains adjustable fixtures for mounting substrates, shrouds for plasma confinement and uniform plasma distribution, uniform gas flow distribution, and a variety of other features designed to provide precise and reliable thin-film deposition processes. The cathode-arc source is a state-of-the-art ion source composed of a rotating anode, a rotating cathode, and an enclosed geometry. The source produces a concentrated, fine ion beam that can be precisely guided to the workpiece to deliver a uniform and consistent deposition flux. An integrated control asset, integrated with the reaction chamber, offers a full range of parameters to control the reaction temperature, process pressure, oxygen concentration, bias voltage, and more. The source also has a variety of safety features including power limits and a safety shutdown model. The protective enclosure consists of an insulated chamber to protect against electric shock and protect against radiation generated by the source. A variety of options, including a quartz window and a variety of shields, is also available to ensure operational safety. Overall, CPA 9900 is an advanced sputtering equipment designed for precise and reliable thin-film deposition processes. It is a dependable and safe system designed for easy operation and maintenance, and is a great choice for any industrial applications requiring quality thin-film deposition processes.
There are no reviews yet