Used CPA / KURDEX 9900 #9116667 for sale
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ID: 9116667
Sputtering system
Entry / Exit load lock:
CPA Chamber
CPA Load lock valve
Load lock chamber, 13.125”
Single pallet operation
Substrate, 12” x 12”
SST Pallet, 15.5”x14”
GP-303 Ion gauge controller
Pallet sensors
Load / Unload station
Process chamber:
CTI CT-8 Cryo pump
VAT Hivac valve
MKS Throttling valve
CTI 8500 Compressor
GP-303 Ion gauge controller
(2) Gas system with VCR gas lines
(2) NUPRO Isolation valves
(2) MKS MFCs for Ar, O2
Chain drive transport system
(2) AE Pinnacle+, 10kw dc power supplies
(1) CPA Process chamber:
(2) CPA 4.75”x15” DC magnetron
Assemblies:
(2) Sets of target shielding
Control system:
Opto-22 PLC, monitor
Manual & auto control modes
Recipe control
I/O Wiring
Ul Approved power box with EMO
CPA Optical pallet sensing system
With controller & sensors
Process parameter control ranges:
Sputtering pressure: 5 - 30 Microns
Conveyor speed: 0.1 - 80 cm.min.
D.C Deposition power level: 100 - 9000 watts
R.F Deposition power level: 50 - 3000 watts
R.F Sputter clean power level: 15 - 1000 watts
Substrate heating: Ambient to 350°C
Uniformity performance:
Etch: ±10%
Deposition:
R.F Magnetron ±10%
D.C Magnetron ±5%
Vacuum performance:
Ultimate pressure
2 x 10(-7) in 16 hrs
5 x 10(-7) in 30 minutes
Rate of rise: 1 x 10(-4) 6 minutes
Vacuum tight: Less than 5 x 10(-10) standard atmosphere cc helium/second
Utility requirements:
4-Wire delta or 5 wire wye
Water temperature: 50 - 75°F (10-24°C)
Air: 70 to 100 PSIG (6 to 8 ATU) filtered, 1 CFM
Sputtering gas: Typically 5 PSIG (1.3 ATU) Argon
Options:
Sputter etch
CPA Etch table assy
AE Matching network
RF Switching assy
AE RF generator
Sputter area mod, 24"
RGA:
LEYBOLD Transpector
Installed with isolation valve
Substrate heater:
Process chamber
Heater assy
Contoller
Wiring
Power: 208 V, 50/60 Hz, 3 Phase, 100 A.
CPA / KURDEX 9900 is a sputter deposition equipment designed for reliable high performance vacuum deposition processes. This system is capable of delivering high quality, uniform thin film materials that have application over a myriad of industries. CPA 9900 comes with multiple options for the work chamber. It has dual chambers that are suitable for sputter deposition as well as vapor deposition processes. One of the chambers can be configured with a cryopump for use in a high vacuum or ultra-high vacuum environment. KURDEX 9900 sputtering unit includes a quad column-style magnetron. This configuration allows users to quickly select the most suitable source configuration for their application. Additionally, this machine offers variable frequency control of the substrate rotation table and a facility to program multiple sputtering recipes. 9900 tool employs magnetic field-assisted sputtering to ensure time-independent deposition rates. The result is a more uniform, cleaner, and thicker film that can meet demanding applications. This asset can also accommodate multi-target sputter configurations, which allows users to deposit different compositions in a single run. This model also comes with a turbo pump with a backing pump, for superior vacuum performance. The turbo pump can be installed separate from the chambers, allowing for hassle-free maintenance of the chambers. Additionally, CPA / KURDEX 9900 has a gas box that is fed with regulated high-purity gases. This gas box allows users to control gases such as argon, nitrogen, oxygen, and hydrogen. In addition to the many features and option offered by CPA 9900, the equipment is user-friendly, and its operation is easy to learn. This system also comes with an intuitive Graphical User Interface (GUI) which simplifies operation and makes programming sputtering jobs easier. KURDEX 9900 is an excellent choice for those needing a reliable and user-friendly sputtering unit. With its multiple configuration options, ease of operation, powerful performance, and great results, this machine is suitable for a wide range of sputtering applications.
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