Used CPA / KURDEX 9900 #9262873 for sale

CPA / KURDEX 9900 sputtering equipment is a high-performance, state-of-the-art sputtering system designed for advanced thin film deposition technology. This advanced sputtering unit features a wide range of features and capabilities, allowing users to achieve superior sputtering results. CPA 9900 sputtering machine is capable of providing up to four magnetron sputtering sources and four rf/dc (direct current) planar sources for the sputtering of films. It is able to achieve a wide range of thicknesses, with very fine control of the sputtering process. This tool also provides excellent uniformity and controllability on both planes. In addition to two magnetron sources and four rf/dc planar sources, KURDEX 9900 is also outfitted with two turbo molecular pumps, allowing for a range of pressure set points. This provides both high throughput and a great degree of control in the sputtering process. 9900 sputtering asset is also equipped with advanced optics, enabling users to accurately measure film thickness and composition. Its advanced vision model and reflected beam devices provide for detailed analysis of surface topography, planarization and homogeneity. This in combination with automated recipe functions, make CPA / KURDEX 9900 an ideal choice for even the most complex thin film deposition projects. CPA 9900 sputtering equipment also has a very user-friendly interface, featuring an easy to use touch-screen interface, allowing the user to quickly adjust the sputtering parameters with few clicks. It also supports a number of advanced processes such as ion etching, edge isolation, multi-layering and film-on-film deposition. The powerful gas control system on this sputtering unit provides excellent control of the gas flows, helping to ensure ideal sputtering performance. Overall, KURDEX 9900 sputtering machine is a powerful and reliable machine that can provide users with optimal sputtering performance, accuracy and uniformity, allowing them to achieve outstanding results with complex thin film deposition processes.