Used CPA / KURDEX V2000 #9159037 for sale
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ID: 9159037
Sputtering system
Process chamber:
Dimensions: 29.625” H x 9.5” W x 26.25” L
Chambers capable of 600 mm x 600 mm
(3) Process chambers with viewing windows
Entry: (1) Chamber
Deposition: (2) Chambers
(1) Load lock valve
Pumping port: CF-275 flange for RGA
Pumping ports for chamber with frame base plate
Standard modules
With up to (4) cathode positions per module
Cryopumped process chamber
Cryopumped load locks
(2) Sets shielding
RGA Port
DC and RF in any mix
Sputter single side or double side
Vacuum performance:
Ultimate pressure:
2 x 10(-7) in 16 hrs
5 x 10(6) in 30 minutes
Rate of rise: 1 x 10(-4) 6 minutes
Utility requirements:
Water:
4 GPM @ 65 PSI per Deposition / Heater position
Power:
208 VAC 3Ø, 60 Hz, 5 wire, 80A
Gas:
Compressed air: 80 PSI min, 90 PSI max
Vent gas (Nitrogen): 10 PSI min, 15 PSI max
Process gas (Argon): 20 PSI min, 25 PSI max
Doors with no cathodes
Hivacs
Cryos
Throttle valves
Load lock valve
Track assembly.
CPA / KURDEX V2000 sputtering equipment is an advanced sputtering tool used to deposit thin films onto various substrates. This powerful tool is powered by a three-phase, AC power supply. It utilizes a proprietary high-vacuum, multi-torr sputtering vacuum chamber with a working pressure of under 1E-5 Torr, allowing up to three separate sources to sputter different films simultaneously. CPA V2000 offers an evaporative source and a separate sputtering source, both of which can deposit film onto the substrate from the same chamber without transferring the substrate. The evaporative source uses ceramic filaments to deposit single or multi-layer films with precise thickness, material composition and index of refraction typically between 1,200 and 5,200 nm. The sputtering source is comprised of an array of four toroidal magnets and a cylindrical anode which is capable of powering up to four sputter sources. This sputter source has a linear power control from 0-100%, allowing greater control over the sputtering process. Additionally, KURDEX V2000 offers a wide range of sputter gun/material combinations, allowing for the production of materials with superior properties. The sputter system is also equipped with load-lock technology which helps maintain a high-vacuum environment by switching between different chambers. This helps regulate the pressure of the chamber to the most consistent levels possible and helps prevent contamination of the deposited films. V2000 is also equipped with an in-chamber temperature control unit which allows for precise temperature control when running sensitive film deposition processes. CPA / KURDEX V2000 is a powerful, precision sputtering machine that is capable of producing a wide range of films with superior properties and superior precision. Its sophisticated design, powerful components, and innovative technologies make CPA V2000 an ideal choice for producing high-quality thin films for various applications.
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