Used CUSTOM CUSTOM #9058888 for sale

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Manufacturer
CUSTOM
Model
CUSTOM
ID: 9058888
Automated sputter cluster tool, 6"-8" Load lock chamber (1) Sputter chamber Robotics: for loading single or multiple 6" and 8" Si wafer/glass substrates Custom design with operation simulating single-chamber Endura 5500 for metal deposition Sputter chamber can be equipped by various sputter sources including AMAT standard 8" magnetrons or Quantum 8" sources Adjustable target to wafer distance Used for metal deposition Gas: Ar (oxygen or nitrogen can be added).
CUSTOM CUSTOM is a sputtering equipment designed to deposit thin films of various materials on substrates. It is typically used in industries such as microelectronics, semiconductors, and photovoltaics. The system is composed of a base unit and a chamber where the sputtering process itself takes place. The first part of the process is introducing a source material to the unit, such as a metal or alloy. This material then enters the sputtering chamber through an electron gun, which then releases electrons onto the source material. The electrons break off small pieces of the material, which are then deposited onto the substrate as a thin film. In order to ensure uniformity of the process, the chamber of CUSTOM sputtering machine is laid out as a circular vacuum chamber that is partitioned into four sections. The source material is placed in each of the four sections, and the electrons are generated from the center of the chamber. This arrangement of electrons and source material allows for optimal ionization of the source material and produces even, consistent films onto the substrate. Once the sputtering process has been completed, the chamber is evacuated and reloaded with a new source material. Depending on the application, the chamber may require different conditions for optimal performance. For example, when producing films for semiconductors, the tool must operate under high-vacuum conditions to ensure that all processes are free from contamination. CUSTOM CUSTOM sputtering asset is capable of producing a variety of thin film materials, making it an ideal choice for a wide range of applications. It is also renowned for its quality and consistency, as it is designed for highly precise sputtering processes. The model's ability to produce uniform films without contamination or defect makes it a great choice for thin film deposition in industries where accuracy is of the utmost importance.
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