Used CVC 2800 #9185093 for sale

CVC 2800 is a highly sophisticated sputtering equipment that is used for the deposition of thin films on substrates of almost any material, from semi-conductors to optical materials. This is used primarily in nanofabrication, as well as in research and development. The main component of the system is the sputter source, which uses gas as an electrical conductor to bombard a target material with electrons. This bombardment causes the target material to vaporize, and the vaporized particles are then deposited onto the substrate in a controlled atmosphere. 2800's source consists of two separate bodies, the upper body and the lower body. The upper body contains a target, while the lower body contains the gas supply and the power conditioner. The target material is selected based on what type of deposition is desired. This is usually a combination of metals like magnesium, titanium, chromium, and aluminum. It can also incorporate other metals such as copper, zinc, and gold. Depending on the substrate material, different target materials can be used. For example, for an electrically conductive substrate like a semiconductor, titanium might be used as the target material. CVC 2800 is compatible with several types of substrates, including silicon, glass, and metals. The unit is well-suited for creating multi-layer films of varying thickness on a single substrate. This is due to the machine's variable pressure capability, which allows for better control over the deposition rate of the films. The tool is capable of a variety of sputtering techniques, including high rate and low rate deposition. The asset also features a built-in pressure gauge and an adjustable gas flow rate control to help maintain sputtering rates. Additionally, the model has the option of being operated in a semi-continuous mode or a multi-step mode. In order to perform at optimal levels, 2800 must be regularly cleaned and maintained. This includes cleaning out the target faces, which can become clogged with deposition residues over time. The equipment also requires regular calibration to make sure that the deposition rates are correct. Overall, CVC 2800 is a powerful and reliable sputtering system that can help to create high quality thin films on almost any substrate. The unit's adjustable parameters can be fine-tuned for each individual application and its compatibility with a wide range of substrate materials makes it a great choice for any research and development laboratory or nanofabrication facility.