Used CVC 2800LL #135121 for sale

CVC 2800LL
Manufacturer
CVC
Model
2800LL
ID: 135121
Sputtering system, depo PVD / PECVD 208V Ac, 3 Phase, 200 Amp & 90~100 psi, 4 cfm System last used in 1996.
CVC 2800LL sputtering equipment is an advanced vacuum deposition system used to produce high-quality thin films on a variety of substrates. It is specifically designed for low-cost production of thin-film photovoltaic cells, a key component of the solar power industry. It is composed of several subsystems: a base unit, a vacuum pump, a sputtering chamber, and a controller. The base unit of 2800LL is made from tough aluminum alloy, providing a high level of durability and corrosion resistance. It houses the vacuum pump and sputtering chamber, along with digital controllers for maintaining the desired pressure and monitoring the process parameters. CVC 2800LL has a maximum operating pressure of 1.8 x 10-6 Torr and can support any substrate size from 2" up to 16". The unit is also equipped with a process chamber window for optimal viewing, allowing easy inspection of the process. The vacuum pump is a two-stage rotary vane pump with a speed range of 5 to 90000 revolutions per minute. The pump is designed to minimize off-gassing and minimize thermal load, providing a consistently clean environment in the chamber. It is also equipped with a safety machine, allowing it to power down in the event of a malfunction. The sputtering chamber itself uses a combination of mechanical, electrical and soft vacuum components designed to achieve the highest deposition and repeatability accuracy. It is a two-level chamber that can hold up to eight targets and is equipped with a variety of target holders and sample holders. The targets are powered by a DC bias power supply, which enables the user to control the substrate temperature and the deposition rate. This enables the user to produce thin films with consistency and accuracy. 2800LL is an efficient and reliable tool suitable for most thin-film applications in solar power production. It is easy to use and maintain and provides superior performance at a competitive price. The asset also features advanced features, including a dual sputter chamber, digital process controllers, and a process window, to maximize deposition quality and efficiency.
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