Used CVC 601 #153595 for sale

CVC 601 is a sputtering equipment revolutionizing the synthesis of advanced materials. It is an advanced physics-based platform specifically designed to deliver micron and sub-micron thin-film deposition with exceptional uniformity and optimal layer thickness. The system is equipped with direct current (DC) power supply and vacuum process chamber, as well as other components. 601 is engineered to perform sputtering using magnetron cathode technology, which utilizes highly precise adjustable magnetic fields to create a steady, high-density plasma source. This enables precise control of the deposition rate and homogenous uniformity of the thin films. Additionally, CVC 601 also incorporates a reflective-plasma sputtering process, which precisely modulates both the ionization and deposition rate of the sputter process. This eliminates the need for manual control and further enhances the uniformity of the thin-film deposition. Other key components of 601 sputtering unit include high-performance pumping units for precise pressure control, advanced vacuum process chamber, and windowless bonded substrates. All these comprise its vacuum chamber. The pressure control machine of the tool is equipped with an airlock to efficiently handle the high-volume loading of substrates. It also features an inert gas injection port for precise gas pressure control in order to guarantee uniform ionization of the sputtering process. The advanced windowless bonded substrate configuration of CVC 601 helps ensure consistent uniformity of the thin film deposition. It also helps reduce the risk of substrate breakage due to harsh thermal cycling. Furthermore, it allows for the optional use of different materials such as: glass, stainless steel or dielectric substrates depending on desired application. 601 is capable of depositing thin films at thicknesses as thin as 250 nanometers onto substrates. In addition, the asset's highly precise process control allows thicknesses to be controlled and optimized for a wide range of applications with no manual adjustment necessary. In summary, CVC 601 sputtering model is designed to produce high quality thin films of consistent uniformity at precise thicknesses with enhanced process efficiency and accuracy. Its superior technology and components guarantee reproducible and reliable deposition with minimal effort and downtime.