Used CVC 601 #83143 for sale

CVC 601 is a high performance magnetron sputtering equipment, used for depositing thin metal and metal alloy films. This system is suited for either reactive or non-reactive sputtering processes. It is composed of two targets, capable of independently producing two different materials simultaneously. The unit has both PVD and PA6 power supplies, enabling the deposition of multi-component film structures, as well as single-component films. 601 features a movable substrate stage that can be accurately set to the desired sputtering angle. This angle can be adjusted for optimal film densification and composition control. The machine has a range of target-loadings and is capable of producing films of different thicknesses. CVC 601 is equipped with a high power, adjustable frequency RF/DC generator and a 2 x 30 cm vacuum chamber. The RF generator has a power range of up to 700 watts and a total combined power of 1400 watts. The generator also has a field strength measuring device and a power control tool, allowing precise control of the sputtering rate. The asset features multiple controls, including RF bias, power, pressure, and temperature. These enable the user to precisely monitor and modulate the deposition process. The temperature range is adjustable between 150-1000 C, with an option for temperature ramping. The temperature range can be quickly set and adjusted by the operator from CVC computer model. 601 also has an ion source, which can be used for ion-assisted sputtering, resulting in an improved film quality. There is also an optional gas injection equipment, which can be used for reactive sputtering processes, with either Argon or Oxygen as the reactive gas. CVC 601 also features an in-line particle analysis system, which can accurately monitor film composition. The particle analysis unit is able to detect particles in the size range of 0.3 to 9.9 microns. In terms of safety, 601 is equipped with interlock safety systems that prevents accidental mis-operations. The machine has CEC approved safety switches, as well as an emergency-stop button. An anti-sputtering device is also available, which prevents particles created during sputtering from entering the chamber. CVC 601 is a powerful and reliable tool that can be used for efficient thin film deposition. It is easy to operate, and can accurately control the deposition process, resulting in uniform film quality. With its combination of flexibility, safety, and ease-of-use, 601 is an ideal tool for thin film deposition.