Used CVC 601 #9003215 for sale

CVC 601 is an advanced sputtering equipment designed to deposit thin films of metals, alloys, semiconductors, and insulators onto substrates, such as thin glass or plastic. It is an industrial-grade sputtering system designed with maximum production efficiency in mind. 601 consists of a chamber that can accommodate up to eight targets and two substrate holders. The targets can be readily changed to achieve positive or negative ion static sputtering. A high pumping speed provides a high-vacuum environment in the chamber for sputtering deposition to occur. CVC 601 utilizes a magnetron-type RF or DC power source, depending on the target material. RF power operates at a frequency of 175 kHz, while DC power uses a three-phase power supply. An arduous ignition method is used to adjust the performance of 601 for the deposition of thin films. A built-in content-based control unit optimizes the process parameters for various deposition conditions. The temperature of the chamber can be controlled using either a water-cooled or air-cooled coolant. Additionally, the chamber can be monitored using the built-in sensors for temperature, pressure, and gas flow. CVC 601 offers both manual and automated control operation for setting the deposition parameters. Utilizing this combination of automated and manual control enables 601 to be tailored for the deposition of thin films that meet specific customer requirements. The process parameters can be stored in programmable memory and accessed when needed, unless manually changed. CVC 601 is designed for use in semiconductor fabrication plants or for research and laboratory studies. With its advanced control machine and high pumping speed, 601 can produce consistent, high-quality thin films for various applications.