Used CVC 601 #9123996 for sale

CVC 601 is a sputtering equipment used in thin film deposition. It is a single-chamber, dual-magnetron system designed for enhancing the efficiency and flexibility of thin film deposition processes. The unit uses a single high-vacuum chamber with a built-in embedded power supply and RF generator for dual magnetron sputtering. It features a rectangular, open-top chamber, an integrated vent for sputtered materials, gas inlet ports at the top and bottom of the chamber, and a vertical setting stage for the substrate. To deposit the thin-film, the sample is loaded into the chamber and a vacuum is established. Argon gas is then introduced into the chamber and is magnetron sputtered by two low-frequency (13.56 MHz) RF generators. Both the power and frequency of the magnetrons can be adjusted for optimal coating. The substrates are placed on a platform that is set at the desired distance from the magnetron targets. The RF power is ramped-up to the desired value, and the sputtered material is collected on the substrate when a deposition coating is desired. 601 sputtering machine is highly efficient and can be used for a variety of thin-film deposition processes. It boasts high rates of deposition and low levels of substrate charging, making it ideal for depositing high quality thin-films on a variety of substrates. The large chamber size allows for multiple substrates to be sputtered, or an even larger substrate can be used for larger coatings. The tool also supports high deposition rates with a large range of magnetron power outputs and the ability to deposit at both high and low temperatures. Furthermore, the asset also features advanced processes such as co-deposition and reactive sputtering. Overall, CVC 601 model is a powerful and effective tool for a variety of thin-film deposition applications. It is a highly efficient and flexible tool that can deposit quality coatings on a variety of materials.