Used CVC AST 400 #126819 for sale

CVC AST 400 Sputtering Equipment is a revolutionary new system for coating objects with a variety of materials. It consists of a high-vacuum chamber, cathode wiring and contacts, an RF RF power source and a central vacuum pumping unit. AST 400 Sputtering Machine is capable of depositing thin layers of metal or other material on a variety of substrates. The vacuum chamber of CVC AST 400 is designed to provide an ultra high vacuum environment for the sputtering process, allowing for thin layers of material to be deposited onto the substrate without causing damage to the substrate. The chamber is equipped with high-vacuum and rapid-cycling valves and is capable of reaching a base pressure of 0.001 torr. The chamber also has an algorithm-driven gas mixing tool for greater control of the sputtering process. The high-efficiency RF generator of the asset provides a controlled and adjustable RF power source which can be used to vary the rate of material deposition, providing precise layer thicknesses. The generator is equipped with a high-descality, low-noise amplifier to ensure that the RF power is consistent and maintained at a constant level during sputtering. The model is complete with an advanced central vacuum pumping equipment which ensures the vacuum chamber maintains an optimal pressure for efficient sputtering. The vacuum pump consists of a high-precision turbo-molecular pump with an adjustable flow rate which is capable of achieving pressures down to 0.001 torr. The pumping system is designed to reduce maintenance time and costs. Overall, AST 400 Sputtering Unit is a revolutionary machine for depositing thin layers of materials onto a variety of substrates. The tool is designed to provide superior results while reducing maintenance costs and time. Its high-efficiency RF generator ensures consistent sputtering results while the central vacuum pumping asset ensures optimal pressure is maintained.