Used CVC CVC 2 #9124375 for sale

CVC CVC 2 is a sputtering equipment used for depositing thin films of material onto substrates. It is a three-source cluster type of sputtering system, meaning that it has three independent deposition sources. It is capable of a wide range of functions, making it useful for many different applications. The unit consists of a main body and up to three additional deposition sources. Each source is connected to the main body via a flexible arm. This allows flexibility when depositing material onto substrates. The main body houses a controller unit which allows for precise control over deposition parameters. The controllers are programmable allowing the user to tailor the deposition to their needs. Before depositing material onto a substrate, a vacuum chamber must be cycled to ensure a proper environment for deposition. The chamber can be cycled by means of a combination of pumping and heating, depending on the vacuum requirements of the user. The three deposition sources are magnetron, arc and e-beam. The magnetron source utilizes a solenoid magnet and sputter targets to ionize gas molecules and deposit a thin film of material onto substrates. The arc source utilizes an induction coil and an electron radiography source to ionize and sputter material. The e-beam source utilizes an electron gun to sputter material and form a thin film on a substrate. In addition to the sources, CVC 2 machine is also equipped with several other components to ensure smooth operation. These components include a loadlock, a chuck table, a sample holder, a vacuum valve, a viewing port for monitoring the process, an evacuation pump, a gas injector, and a water chiller. CVC CVC 2 tool is highly adaptable and can be used for a variety of vacuum-based applications. For example, it can be used for electrical contact applications, such as a thin film resistor. Additionally, the asset can be used for deposition of materials onto silicon wafers for MEMS and IC fabrication, as well as for thin film sputtering of zinc sulfide and silicon nitride for optics. In conclusion, CVC 2 is a robust three source cluster sputtering model, capable of deposition of a variety of materials onto substrates. It is highly adaptable and can be used for a variety of applications. With its multiple deposition sources and various other components, it is one of the most efficient and reliable systems for sputtering of materials.