Used CVC CVC linear actuator #9124376 for sale

ID: 9124376
Linear actuator.
A CVC CVC linear actuator is a type of sputtering equipment that is used to deposit thin layers of material onto a substrate. This system utilizes a two-stage linear actuator to provide an even and consistent deposition of material. The unit is composed of two vacuum-controlled chambers that are connected by a conveyor machine. The first chamber contains the substrate and is connected to a linear motion actuator and vacuum chamber. This chamber is used to move the substrate through the tool and to provide the necessary vacuum. The second chamber contains the sputtering target, which is a source of the material to be deposited onto the substrate. The sputtering target is also connected to a linear motion actuator and a vacuum chamber. CVC linear actuator asset utilizes two linear motion actuators to consecutively move the substrate and sputtering target with precise accuracy and speed. The two linear actuators provide the capability for precise alignment and positioning during operation, as well as the ability to vary the speed of movement. This ability allows for control over the deposition of material and precise control over the thickness of the resulting thin layers. Additionally, the linear actuators provide a high degree of flexibility and provide the ability to deposit multiple thin layers of different materials onto the substrate in one cycle. CVC CVC linear actuator operates on the same principles as other sputtering systems; the sputtering target is biased during deposition, causing the material to sputter onto the substrate. The sputtered material adheres to the substrate and forms an even coating upon completion. CVC linear actuator is a versatile model that is well suited to a variety of applications and can be used to produce thin layers of various materials. The precise deposition of material, the ability to adjust speed and thickness of the coatings, and the high degree of flexibility make CVC CVC linear actuator a popular choice for many thin-film deposition operations.
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