Used CVC ICS 660 #135722 for sale

CVC ICS 660 is a direct current (DC) magnetron sputtering equipment used to deposit thin films of a variety of coatings onto substrates. This sputtering system combines a high performance sputter gun, with a unique combination of gun-mounts, that are engineered to deliver superior substrate coverage and unparalleled life in high-power applications. The unit is powered by a DC power supply with adjustable voltage and current settings that are separately adjustable for each gun. ICS 660 features a wide variety of magnets including rectangular and circular magnets, which allow for fine tuning of the sputtering process. The machine is based on the rotating magnetron sputtering (RMS) process, in which a high-power magnetron gun is mounted on a rotating platform between the substrate and a rotating source magnet. This type of sputtering tool produces uniform distribution of material onto the substrate, and has several advantages over the more traditional, planar sputtering systems. Most importantly, the rotating aspects of the asset allows for the uniform deposition of thin layers over the entire substrate surface. This uniform deposition process eliminates deposition in blind spots close to the edges of the substrate, which can produce non-uniform layer thickness. CVC ICS 660 also includes a variety of advanced features. The rotating gun mount enables precise adjustments to the sputter angle to ensure optimal coverage of the substrate. Additionally, the adjustable pressure gauges allow users to re-adjust the pressure according to the individual application requirements. The model is also equipped with smart sensors that can detect when the sputter gun is about to lose target material, and automatically adjust the process parameters in order to maintain a easy and consistent deposition rate. ICS 660 sputtering equipment produces high-quality thin films for a variety of industrial applications, ranging from microelectronics to aerospace applications. Utilizing DC power supplies and the RMS process, CVC ICS 660 provides uniform deposition of metal, metal oxide, and other thin film materials on virtually any size or shape of substrate. Its advanced features ensure a high degree of accuracy and reliability, while providing the user with the ability to fine-tune the deposition process to meet their specific requirements.