Used CVC PSE43 #70877 for sale
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ID: 70877
High vacuum station. Includes CVC Model PMC4 diffusion pump rated at 690 l/s, a BCN41 LN2 baffle, manual valves and a 17 CFM mechanical roughing pump. This system terminates in a 4" ASA flange, and also includes a CVC combination ion/thermocouple gauge.
CVC PSE43 is a sputtering equipment designed for low-voltage vacuum deposition of material onto substrates. It is designed for applications such as thin-film deposition and semiconductor coating, with a focus on efficiency, speed and ease of use. PSE43 is a three-station direct sputter process system, which offers greater control and optimization of the process. The unit has a large plasma atmosphere chamber from which a wide variety of cathode materials can be deposited onto the substrate. The substrate is placed on an annular sample holder, which is inserted into the deposition chamber, and the sample holder rotates within the chamber to ensure uniform coating and even distribution of the deposited material. The machine is equipped with a digital feedback tool, which ensures the asset remains in a stable state while the sputtering process is in progress. The model offers fine tuning of the current, pressure, plasma and temperature settings to give optimum performance. The gas sources used in the equipment include Argon, Oxygen, Nitrogen and Hydrogen, with a wide selection of compatible alloy-target materials. CVC PSE43 is engineered with a robust, yet reliable, construction that is capable of coping with the wide range of environment conditions presented during the deposition process. Various safety measures, such as alarms, are designed in to the system should operational parameters exceed their normal ranges. PSE43 is easy to use and offers a range of useful features and reports. It incorporates a user-friendly graphical interface that allows for easy monitoring of the process parameters whilst the deposition is in progress. Furthermore, the interface provides a range of useful reports, such as cycle summaries and trend charts, and real-time analysis of the process. Overall, CVC PSE43 is an efficient, reliable, and user-friendly sputtering unit which is suitable for a range of thin film deposition and semiconductor applications. The machine offers a reliable and robust construction and a range of features which make it an ideal choice for those needing a cost-effective and reliable tool.
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