Used DENTON VACUUM DESK II #9123964 for sale

ID: 9123964
SEM Gold sputtering system table top Glass bell jar Single target Single wafer or standard SEM samples Includes a Power supply.
DENTON VACUUM DESK II is an advanced sputtering equipment designed to offer uniform and repeatable sputtering deposition over large areas. The system is composed of a power supply controller, two planar magnetrons, and a vacuum chamber. It features a large chamber and a versatile mount design to accommodate substrates of up to 600mm x 600mm in size. The Vacuum DESK II is capable of reaching a base pressure of 1 x 10-7 Torr, and the chamber is equipped with isolation valves for locking the chamber during operation. The unit is powered by a frequency modulated power supply controller which allows for precise, controllable power levels of up to 2000W per magnetron for optimalresults. The magnetrons are mounted on the planar x-y mount, which can be adjusted for positioning and tilt-angle. The tilt-angle settings allow the user to direct the sputtering targets in various directions for uniform deposition of the material on the substrate. The Vacuum DENTON VACUUM DESK II also features a patented ultra-high speed shutter machine, which allows for rapid on/off sputtering operations. A digital RF protection circuit is included to reduce the risk of electrical interference during operation. The tool also includes a remote control for ease of operation, and is capable of being used in conjunction with other Vacuum Desk systems for increased production needs. It is designed and manufactured for use in either manual or automated systems. The Vacuum DESK II delivers high-performance sputtering deposition of a variety of metals, oxides, and nitrides. It is suitable for use in both laboratory research and production facilities. This asset offers a reliable and consistent deposition process, making it an ideal choice for the harsh production environment of the semiconductor industry. With its advanced feature set, the Vacuum DENTON VACUUM DESK II is an ideal choice for a variety of sputtering applications.
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