Used DENTON VACUUM DESK II #9213639 for sale

DENTON VACUUM DESK II is a sputtering equipment that is used for the deposition of thin films of materials onto a substrate. It is comprised of a vacuum chamber, a power supply, a gas and pumping system, and a deposition source. The sputtering process is performed within the vacuum chamber which is made of stainless steel and is environmentally sealed. This chamber is specially designed to create a high-vacuum environment, allowing for the efficient transport of the sputtered species to the substrate at a very low pressure. The power supply for the unit consists of a DC magnetron sputtering source with a standard operating range of 0 to 1,000 watts. The magnetron source is responsible for providing the energy required to initiate and sustain the sputtering process. It is protected by a variety of vacuum Shielded cables and other protective components. It also offers both manual and automatic current control to facilitate the precise deposition of films. The gas and pumping machine is used to create and maintain a specified gas composition and pressure in the deposition chamber. The pumping tool consists of a turbomolecular pump, a high-speed rotary pump, monochrome ion pump, and an inert gas asset. This model is designed to provide a vacuum environment with a minimum pressure of 10-5 torr. The gas inlet is adjustable to ensure that the metal or alloy films can be obtained with different gas compositions. The deposition source, which is of quartz construction, is used to provide an efficient deposition of sputtered species onto the substrate surface. It is able to handle a variety of substrates of up to 6-inch in size with minimal exposure to the background atmosphere. An array of magnets are used to control the direction and intensity of the sputtered species to ensure that the films are placed with a uniform thickness and a precise distribution. DESK II is an efficient sputtering equipment that is ideal for the precision deposition of metal and alloy films on a variety of substrates. It provides a high-vacuum environment with adjustable pressure and gas composition, ensuring accurate deposition of films to exact requirements. The system is also equipped with a monitoring unit that is able to track and control the process parameters at all times to ensure the quality and performance of the resulting film.