Used EDWARDS S150B #293809357 for sale
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ID: 293809357
Sputter coater
Boro silicate glass
Implosion guard
Water cooled copper specimen table, 4"
Sputtering rate: 60 nm per minute
E2M2 Rotary vane pump
Automatic reset
(4) Cathodes
Vacuum measurement:
Pirani 10 Control unit: 5 mbar
PR 10-K Gauge head
Power supply: 220~240 V, 5 Phase, 50 Hz.
EDWARDS S150B is a high-performance sputtering equipment designed for thin film deposition in advanced semiconductor, optics, and electronics manufacturing applications. This system offers cutting-edge technology and exceptional performance to meet the demanding requirements of modern thin film deposition processes. EDWARDS S 150 B utilizes a magnetron sputtering technique to deposit thin films of various materials onto substrates with high precision and uniformity. Magnetron sputtering is a physical vapor deposition (PVD) process in which a target material is bombarded with high-energy ions, causing atoms to be ejected and deposited onto a substrate to form a thin film. One of the key features of S150B is its advanced vacuum unit, which provides a high vacuum environment essential for achieving high-quality thin films with excellent adhesion and uniformity. The vacuum machine includes high-performance turbomolecular pumps, cryogenic pumps, and other components to ensure low base pressures and efficient gas evacuation during the deposition process. The sputtering chamber of S 150 B is designed for maximum versatility and ease of use, with a customizable configuration to accommodate various target sizes and shapes. The chamber is equipped with in-situ process monitoring and control systems to optimize the deposition parameters and ensure consistent film properties across multiple runs. EDWARDS S150B features state-of-the-art magnetron sources that deliver high target utilization efficiency and uniform sputtering rates across the substrate surface. The magnetron sources can be easily configured for reactive sputtering processes, enabling the deposition of compound thin films with precise stoichiometry control. To enhance process flexibility and productivity, EDWARDS S 150 B is equipped with a sophisticated automation tool that allows for recipe-driven operation, real-time monitoring of process parameters, and remote control capabilities. This automation asset enables users to easily set up and execute complex deposition processes with minimal manual intervention, leading to improved process repeatability and efficiency. In addition to its advanced technical capabilities, S150B is designed with user-friendly features to streamline maintenance and troubleshooting tasks. The model includes comprehensive diagnostics and error reporting tools to quickly identify and resolve issues, minimizing downtime and maximizing equipment uptime. Overall, S 150 B sputtering system is a versatile and reliable tool for thin film deposition in research and production environments. Its advanced capabilities, superior performance, and user-friendly design make it an ideal choice for applications that require precise control over thin film properties and excellent process repeatability.
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