Used EVATEC Radiance BPM5 #293650365 for sale

EVATEC Radiance BPM5 is a high power magnetron sputtering equipment designed for the deposition of conductive, temperature sensitive and extremely thin materials on large substrates. It is designed to provide highest uniformity and cost efficiency in the field of thin film deposition. It is an advanced platform which combines superior precision, low sputtering power consumption, high deposition rate and excellent reproducibility. Radiance BPM5 comes equipped with a variable power noble gas generator, a high power sputtering gun, a vacuum chamber, high-precision motion systems, a turret sputtering depo-centre and a vacuum pumping system. The variable power noble gas generator provides uniform distribution of argon gas over the entire target area, while the sputtering gun is used to activate the target and cause it to melt and adhere to the substrate. The combination of the high-precision motion systems, turret sputtering depo-centre and vacuum pumping unit allows for a precise and accurate deposition process. EVATEC Radiance BPM5 has the capability to deposit a wide range of materials including conductive and temperature sensitive materials with extraordinary uniformity. The deposition uniformity is achieved by the horizontal movement of the target without any heating required. Additionally, the combination of low sputtering power consumption and high deposition rate ensures fast and efficient deposition of the required materials. Target preparation is an important part in sputtering machine and Radiance BPM5 is designed to take this into account. It uses a target pre-treatment process that prevents oxidation of the target and thus ensure reliable results. Moreover, the tool is equipped with an automated target swap feature which allows for easy preparation of multiple targets and drastically reduce downtime during the sputtering process. In addition to its deposition capabilities, EVATEC Radiance BPM5 also offers advanced monitor and control features to ensure dependable and consistent results. It is loaded with an integrated controller and data logging asset that lets the user to precisely monitor, measure and analyze the processes in real time. This in turn allows for faster troubleshooting and optimization of the process, thus enabling improved yield and uniformity. To sum up, Radiance BPM5 is an advanced sputtering model that provides remarkable deposition uniformity, low sputtering power consumption, high deposition rate and excellent reproducibility. It is ideal for the deposition of various materials over large substrates and is capable of producing high quality and highly reliable results each and every time.