Used EVATEC Radiance #293650371 for sale

EVATEC Radiance is a state-of-the-art sputtering equipment developed by EVATEC that combines high deposition rates with exceptional uniformity measurements. The equipment is particularly suitable for industrial applications such as optics, displays, photovoltaics, data storage and MEMS. It features the patented DynamiK® target exchanger, the SputterFlow dual-source power supply and the Quick-Connect® target mount. The DynamiK® target exchanger is a motorized target exchanger with a target-in/target-out cycle time of less than 50 seconds. This allows for high throughput and fast switching between targets. The SputterFlow dual-source power supply is designed to ensure smooth power transitions when switching between different targets. This enhances the uniformity of the deposited layer. The Quick-Connect® target mount is designed with a quick-change mount system and adjustable target height. This facilitates simple and fast target mounting and exchange. In addition to its advanced design, Radiance unit also offers a wide range of process parameters. This includes a target-to-substrate distance of up to 30 cm, a power range from 10W to 1500W, a number of source gases and a gap closure of up to 150mtorr. The machine has also been certified for ultra-high vacuum applications, offering a base pressure of 10-7 mtorr. This makes it ideal for the deposition of ultra-thin layers. EVATEC Radiance is available with a variety of chamber sizes and can be operated manually or completely automated. An optional radio frequency (RF) source can also be added, allowing for improved deposition uniformity and higher deposition rates. Overall, the tool provides a turn-key solution for high performance sputtering processes.