Used FHR Line 1100 V #9257517 for sale
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ID: 9257517
Inline sputtering system
Deposition of dielectric coatings: 7° front side
Modules:
Module 1: Loading station
Module 2: Input load lock
Module 3: Buffer chamber 1
Module 4: Transfer chamber
Module 5:
Process chamber 1: Etching and sputtering
Module 6:
Process chamber 2: Sputtering
Module 7:
Process chamber 3: Sputtering
Module 8: Transfer chamber
Module 9: Output load lock
Module 10: Unloading station
Substrate load / unload module using (2) KUKA robots
Vacuum:
End pressure: ≤2 x 10^-6 mbar after 8 hours
End pressure: ≤1.5 x 10^-6 mbar after 12 hours
Chambers:
Stainless steel vacuum chamber
Powder coated mild steel chamber frame
Pneumatic gate valves
Modules includes:
Turbo molecular pump: DN 250 ISO-K
View port: DN 100
Front service flange
Flap valves VAT
Rotary dry pump: 300 m³/h and 250 m³/h
Roots pump: 1000 m³/h
1900 Is^-1 for N2 and ca 1400 I/s for N2
Gate valves DN 250
Meissner trap with cryo generator
(6) Pirani gauges fore vacuum sensors: 1000 mbar - 10^-3 mbar
(8) Penning high vacuum sensors: 10^-3 mbar - 10^-8 mbar
(13) Baratrons MKS 627: 10^-1 mbar - 10^-4 mbar
Upstream pressure regulation
Atmospheric pressure sensors
Heater
Vacuum gauges
Inverted magnetron plasma source:
Target length: ~39"
Planar sputtering cathodes:
(10) Cathodes
Target length: 39"
Target substrate distance: 4"
Rotatable sputtering cathodes:
(10) Cathodes
SCI
Type: MC-End block
Target length: 39"
Backing tube diameter: 5"
Target substrate distance: 4"
Gas admission system:
MFC for Ar each sputtering source
Gas lines for 5N purity
Power supplies:
High voltage power supply for inverted magnetron plasma source
DC AE Power supply: ≥1 kW
DC AE Power supply: 2 x 6 kW
DC AE Power supply: 30 kW
(5) DC AE Power supply: 2 x 10 kW
Control and visualization:
PC Surface
Operating system: Windows 7 Professional
PLC General control
Cooling water:
Power supplies (PSU)
Cathode
Cathode surrounds cooled by water loops
Power supplies:
Aggregate connection: 3 / N / PE AC 380 V / 50 Hz
Voltage: 24 V.
FHR Line 1100 V sputtering equipment is a versatile and reliable coating system designed to deposit thin films on a variety of substrates. It is suited to the production of a range of materials, including metals, ceramic, oxides, and other compounds. It is a highly productive unit with an ability to coating surface areas up to 1250 by 1100 mm. Line 1100 V is a vacuum-sealed chamber, allowing it to maintain the right environment for producing top-quality films. The chamber includes a process gas inlet and outlet, allowing for introduction of the gases and vapors necessary for successful sputtering. The machine is designed with high power outputs in mind, ranging from 3 to 6 kW. It is also designed for highly accurate and repeatable sputtering, with features such as computer-controlled voltage mapping and the ability to transfer films in mono or dual component mode. In addition, the 1100V is able to perform reactive sputtering, passive sputtering, as well as deposition methods for a variety of flaked and powdered materials. FHR Line 1100 V enables fine control over the amount of energy which is delivered to the substrate during the deposition process. Features such as the computer-controlled voltage and current mapping ensure that the process is maintained at high accuracy and repeatability during the deposition of the thin films. The sputtered film is highly uniform due to the tool's efficient designs and power outputs which allow for precise film layer thickness. The asset also offers a powerful, integrated control model featuring software suites with graphical processing units and flexible programming options. This allows users to fine-tune the process parameters with accurate results and features such as real-time auto-monitoring of process parameters. Line 1100 V also features integrated fault-finding diagnostics, making it easier to troubleshoot problems in the process. Overall, FHR Line 1100 V is an ideal solution for a wide range of thin film deposition processes, with features that ensure repeatable and accurate results. Its powerful control systems and consistent performance make it an invaluable equipment for many production processes.
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