Used FHR Line 1100 V7 #9257514 for sale
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ID: 9257514
Inline sputtering system
Deposition of dielectric coatings: 7° front side
Modules:
Module 1: Loading station
Module 2: Input load lock
Module 3: Buffer chamber 1
Module 4: Buffer chamber 2
Module 5: Sputtering pseudo reactive
Module 6: Gas separation buffer chamber
Module 7: Sputtering reactive
Module 8: Output load lock
Module 9: Unloading station
Substrate load / Unload module using (2) KUKA robots
Vacuum:
End pressure: ≤2 x 10^-6 mbar after 8 hours
End pressure: ≤1.5 x 10^-6 mbar after 12 hours
Chambers:
Stainless steel vacuum chamber
Powder coated mild steel chamber frame
Pneumatic gate valves
Modules includes:
Turbo molecular pump: DN 250 ISO-K
View port: DN 100
Front service flange
Flap valves VAT
Rotary dry pump: 300 m³/h and 250 m³/h
Roots pump: 1000 m³/h
1900 Is^-1 for N2 and ca 1400 I/s for N2
Gate valves DN 250
Meissner trap with cryo generator
(6) Pirani gauge fore vacuum sensors: 1000 mbar-10^-3 mbar
(8) Penning high vacuum sensors: 10^-3 mbar-10^-8 mbar
(13) Baratrons MKS 627: 10^-1 mbar-10^-4 mbar
Upstream pressure regulation
Atmospheric pressure sensors
Heater
vacuum gauges
Reserve flanges
Rotatable sputtering cathodes:
(8) TiOx cathodes
SCI MC End block
Target length: 43"
Backing tube diameter: 5"
Target substrate distance: 4"
Gas admission system:
MFC for Ar each sputtering source
Gas lines for 5N purity
(4) MF Bipolar power supplies
Control and visualization:
PC Surface
Operating system: Windows 7 Professional
PLC General control
Cooling water:
Power supplies
Cathode
Cathode surrounds cooled by water loops
Power supplies:
Aggregate connection: 3 / N / PE AC 380 V / 50 Hz
24 V.
FHR Line 1100 V7 is a sputtering equipment designed and manufactured by FHR. It is a physical vapor deposition (PVD) system capable of depositing thin films of metal, dielectric, and/or ceramic materials onto substrates through a process known as sputtering. Line 1100 V7 is designed for industrial applications and is equipped with a variety of features to support high-volume production. FHR Line 1100 V7 is powered by a generator that can produce power outputs ranging from 1KW to 8KW in either manual or automatic mode. Its vacuum unit is comprised of two stages; a roughing pump for evacuating the target chamber, and a turbo-pump for maintaining high-vacuum conditions. This machine can reach pressures of 10-7 Torr in the deposition chamber, with a base pressure of 10-11 Torr. Line 1100 V7 can be configured with one to four magnetrons, which can be operated concurrently and independently. Each magnetron is equipped with a ceramic or steel target for depositing the material. This tool can also be used for reactive sputtering to deposit oxide or nitride materials, as well as indium tin oxide (ITO) in the case of transparent conductive oxide (TCO) coatings. FHR Line 1100 V7 features an ultra-accurate scanning asset that can be programmed to coat substrates of different sizes and shapes. It can be used to deposit materials with customizable thicknesses, with a maximum layer thickness of 25 microns. Furthermore, it is equipped with support for multiple substrates. It has dedicated substrate holders to support substrates as thin as 0.1 mm and in sizes of up to 300mm square. The model is also capable of controlling substrate temperature independently to help tune properties such as optical clarity or stress. Line 1100 V7 has been designed for operator safety and ease of use. Its modular design makes it easy to install and service. For maintenance, FHR Line 1100 V7 features an automated purging equipment that can quickly evacuate the chamber of remaining materials and contaminants. Furthermore, it can be configured with remote monitoring and control options, to enable operation from a distance. Finally, the system is capable of generating detailed analytics, allowing for precise process optimization and tracking.
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