Used FHR Line 2500H #293811319 for sale

FHR Line 2500H is a state-of-the-art sputtering equipment designed for high-performance thin film deposition applications in the semiconductor, optics, and research industries. Developed by FHR Anlagenbau GmbH, a leading manufacturer of vacuum coating equipment, Line 2500H represents the latest technological advancements in sputtering technology. At the core of FHR Line 2500H system is a high-vacuum chamber with multiple process stations, each equipped with magnetron sputter sources for depositing a wide range of materials with high precision and uniformity. The unit is designed to accommodate substrates up to 300 mm in diameter, making it suitable for large-scale production and research applications. Line 2500H features a sophisticated control machine that allows for precise control of the sputtering process parameters, including deposition rate, film thickness, composition, and uniformity. The tool is capable of operating in both DC and RF sputtering modes, providing flexibility in process development and optimization. One of the key features of FHR Line 2500H is its advanced substrate handling asset, which ensures efficient loading and unloading of substrates while maintaining a high level of process cleanliness. The model is equipped with a robotic arm that can transfer substrates between process stations with high accuracy and reproducibility, minimizing downtime and increasing productivity. Line 2500H is also equipped with a comprehensive suite of safety features to ensure operator protection and equipment reliability. These include interlocks and sensors that monitor system parameters such as vacuum level, gas flow, and temperature, and trigger automatic shutdown in case of any anomalies. The sputtering sources in FHR Line 2500H are designed for high target utilization and long-term stability, ensuring consistent film quality and minimizing maintenance downtime. The unit is also equipped with in-situ process monitoring capabilities, such as optical emission spectroscopy and quartz crystal microbalance, allowing real-time monitoring of the deposition process and feedback control of process parameters. In addition to its high-performance capabilities, Line 2500H is designed with scalability in mind, allowing for easy integration of additional process stations or upgrades to accommodate future process requirements. The machine is also supported by FHR team of technical experts, who provide installation, training, and ongoing support to ensure the tool's optimal performance. In conclusion, FHR Line 2500H sputtering asset is a versatile and reliable tool for high-performance thin film deposition applications, offering advanced capabilities, precise control, and scalability to meet the evolving needs of the semiconductor, optics, and research industries. Its cutting-edge technology and robust design make it a top choice for researchers and manufacturers seeking a high-quality sputtering solution.